Tiangang® HS-200A

High Molecular Weight Oligomeric HALS · HS-200A

direct alternative to UV 2020, and it is

Key Advantages

a) High MW polymeric structure
High MW polymeric structure
b) Low volatility & migration
Low volatility & migration
c) Extraction-resistant, durable
Extraction-resistant, durable
d) Good resin compatibility
Good resin compatibility

Technical Data

Chemical name1,6-Hexanediamine, N,N'-bis(2,2,6,6-tetramethyl-4-piperidinyl)-, Polymers with 2,4,6-trichloro-1,3,5-triazin, reaction products with N-butyl-1-butanamine and N-butyl-2,2,6,6-tetramethyl-4-piperidinamine
CAS number192268-64-7
Structureimage.png
Description
 		 Tiangang® HS-200A is a highly effective radical scavenger that protects organic polymers against degradation caused by exposure to ultraviolet radiation. It is an oligomeric HALS characterized by extremely low volatility, high thermal stability and excellent compatibility with many substrates. Its oligomeric structure makes it particularly effective when used in thin section articles such as fiber and film. Tiangang® HS-200A is suited for use in polypropylene, LDPE, HDPE, XPE, EVA and PP blends with elastomers. Tiangang® HS-200A is also effective as an antioxidant for long term thermal stability. Tiangang® HS-200A can directly replace Chimassorb 2020.

 Appearance Molecular weight Specific gravity, g/ml@ 20oC Softening range
oC		 Flash point
oC
Tiangang® HS-200A Pale yellow pastilles 2600~3400 1.01 120 ~ 150 > 160
Tiangang® HS-200A-LD Pale yellow powder
Tiangang® HS-200A Acetone Chloroform Hexane Benzene Methyl chloride Methanol Water
50 50 40 50 50 30 < 0.01
Tiangang® HS-200A The use of proper protective equipment is recommended. Excess exposure to the product should be avoided. Wash thoroughly after handling. Store the product in a cool, dry, well-ventilated area away from incompatible materials.
Light Stabilizer DisclaimerThe information supplied is presented in good faith and has been derived from sources believed to be reliable. Since conditions of use are beyond our control, all risks are assumed by the user. No representation is expressed or implied, and nothing herein shall be construed as permission or recommendation to practice a patented invention without license.

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